RESEARCH PAPER
Application of plasma in microelectronics
1
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662, Warsaw, Poland
Publication date: 2021-09-08
Acta Agroph. 2002, (80), 383-392
KEYWORDS
ABSTRACT
The paper gives a brief review of issues related to the application of plasma techniques in microelectronics. As an illustration there are also presented and discussed exemplary results of applying plasma methods for GaN and SiC etching.
METADATA IN OTHER LANGUAGES:
Polish
Plazma w mikroelektronice
plazma nieizotermiczna, mikroelektronika. trawienie warstw, GaN, SiC
Referat w zwięzły sposób przedstawia przykłady zastosowań plazmy nieizotermicznej w procesach technologicznych wytwarzania struktur mikro- i nano-elektroniki. Jako ilustracja przedstawione są przykłady zastosowania plazmy do trawienia GaN i SiC.
| eISSN: | 2300-6730 |
| ISSN: | 1234-4125 |
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